Carbon Lab

 

Facilities
 

1- Sputtering deposition system

    RFPECVD : Radio frequency Plasma Enhanced Chemical Vapor Deposition, HindVac Co.

    Equipped with:
    RF generator, 13.56 MHz, Single target, Heat treatable during sputtering up to 600oC, Chamber vacuum limit:
    10-6 mbar

 

2- Raman Spectrometry
    
A    vantes Co. Equipped with green laser, 532 nm, 0-5500 ±4 cm-1
      
S    uspension and powder samples are preferred.

3- UV-visible Spectrometry

    StellarNet Inc. 200-850 ± 0.5 nm. Single beam, portable.Working in transmittance and Reflectance modes.

4- Electroanalyzer system

    SAMA Co. Model 500, Equipped with platinum wire(CE) and Ag/AgCl (RE)

5- Hot plate & Stirrer

    BANTE Co. MS400, Hot plate equipped with thermal probe for solutions, up to 400 ± 3 oC.

    Magnetic stirrer, Up to 1250 rpm. 2 L support.

6- Xenon lamp

    Ushio, 500 W, Tunable power. Equipped with IR filter.

7- Box furnace

    Azar Co. 11 L, up to 1250 oC, Programmable.

 

8- Tube furnace

     Exciton Co.Up to 1200 oC, Programmable, Equipped with quartz tube

9- Ultrasonic bath

1) Digital Ultrasonic Cleaner, WISD Co. WUC- D10H. 210 W, 40 kHz, Frequency and Temperature (up to 90 oC) tunable. Inside diameter: 29*15*15 cm.

2) Small Ultrasonic bath, 30 W, 46 kHz

10- Water deionizer

       RONAK Co. Equipped with dual TDS Monitor. Purification capacity ~ 10 L/day.

11- Current source

12- Power supply

      ESCORT Co. up to 120 V.

      Power Supply (Mulian Tous Co. Up to 20 V) + Magnet for 0.5 T magnetic field.

13- Digital balance

       A&D Co. ±0.0001 gr, Up to 220 gr.

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